Products
We have more than 100 kinds of products in Special gas, Rare gas and Excimer Laser Gas
Product Parameters
|
Other names: |
Argon fluoride laser gas（193nm）；Krypton fluoride laser gas（248nm）；（308nm）Xenon chloride laser gas |
|
Product type: |
ArF，KrF，XeCl，5%F2/He, Kr/Ne,F2/Kr/Ne,Ar/Ne,F2/Ar/Ne |
|
UN NO. : |
UN1956 |
|
Cylinder volume: |
11L，16L，20L，49L，50L |
|
Valve type: |
CGA679，DIN 8，DIN 14 |
Application Program
Excimer laser gas mixtures, also known as rare gas halide mixtures, are used in excimer lasers, which are a type of ultraviolet laser used in various industrial and medical applications. These gas mixtures typically include a rare gas such as argon, krypton, or xenon, combined with a halogen gas such as fluorine or chlorine.The excimer laser gas mixtures produce short bursts of high-energy ultraviolet light, which can be used for precise material ablation and surface modification. This makes them ideal for applications such as micromachining, lithography, and ophthalmology.Moreover, these gas mixtures can also be used in medical applications, such as in the treatment of skin disorders and corneal refractive surgery.
Excimer Laser Gas Mixtures for Precision Instrument Manufacturing
Excimer Laser Gas Mixtures for Medical Devices
Excimer laser gas mixtures for scientific research
Excimer laser gas mixtures are used in security and surveillance applications.
Excimer laser gas mixtures for environmental protection
Excimer laser gas mixtures for industrial manufacturing
Packing&Shipping
Product Detail
| 品 牌 brand | 机 型 type | 波 长 Wave length | 气体 gas |
| ATL | ATL ARF-1 | 193 nm | F2,Ar,Xe,Ne |
| ATL KRF-1 | 248 nm | F2,Kr,Xe,Ne | |
| TUI | CTFTS-ARFV 2.2 | 193 nm | F2,Ar,He,Ne |
| CTFTS-KRFV 2.1 | 248 nm | F2,Kr,He,Ne | |
| CTFTS-KRFV 2.2 | 248 nm | F2,Kr,He,Xe,Ne | |
| CTMD-ARFV 2.0 | 193 nm | F2,Ar,He,O2,Ne | |
| CTMD-XECLV 2.1 | 308 nm | HCl,H2,Xe,Ne | |
| CTMN-ARFV 2.0 | 193 nm | F2,Ar,He,Ne | |
| CTMN-ARFV 2.1 | 193 nm | F2,Ar,He,Ne | |
| CTMN-KRFV 1.0 | 248 nm | F2,Kr,He,Ne | |
| CTMN-KRFV 2.0 | 248 nm | F2,Kr,He,Ne | |
| CTMN-XECLV 2.0 | 308 nm | HCl,H2,Xe,Ne | |
| CTMN-XECLV 5.0 | 308 nm | HCl,H2,Xe,Ne | |
| CTMN-XEFV 1.1 | 450nm~520nm | F2,Xe,He,Ne | |
| CTMN-XEFV 1.2 | 450nm~520nm | F2,Xe,He,Ne | |
| GAM Laser | EX5 ArF | 193 nm | F2,Ar,He,O2,Ne |
| EX5 KrF | 248 nm | F2,Kr,He,Ne | |
| EX5 XeCl | 308 nm | HCl,H2,Xe,Ne | |
| EX10 | 193 nm | F2,Ar,He,Ne | |
| EX50 | 193 nm | F2,Ar,He,Ne | |
| EX100 | 193 nm | F2,Ar,He,Ne | |
| Photomedex | XeCl | 308 nm | HCl,Xe,Ne |
| Photoscribe | ArF | 193 nm | F2,Ar,Ne |
| KrF | 248 nm | F2,Kr,Ne | |
| PotomacPhotonics | ArF | 193 nm | F2,Ar,Ne |
| KrF | 248 nm | F2,Kr,Ne | |
| Spectranetics | XeCl | 308 nm | HCl,H2,Xe,Ne |
| Other names: | Argon fluoride laser gas（193nm）；Krypton fluoride laser gas（248nm）；（308nm）Xenon chloride laser gas | |
| Product type: | ArF，KrF，XeCl，5%F2/He, Kr/Ne,F2/Kr/Ne,Ar/Ne,F2/Ar/Ne | |
| UN NO. : | UN1956 | |
| Cylinder volume: | 11L，16L，20L，49L，50L | |
| Valve type: | CGA679，DIN 8，DIN 14 | |
| High power excimer laser gas | ||
| Available wavelength | 193 nm | ArF |
| 248 nm | KrF | |
| 308 nm | XeCl | |
| 450nm~520nm | XeF | |
| Maximum UV power | 540 W | |
| Maximum ultraviolet energy | 1100 mj | |
| Repetition frequency | Variable， 1~600 Hz | |
| Pulse stability | 0.5%~1%，rms | |
| Long-term drift | 0.1%~0.5%，rms | |
| Beam distribution | Uniform, Flat top | |
| Pulse width | 10~20 ns | |
| Relative gas purity | F2, 99.9% | |
| Ar, 99.9999% | ||
| He, 99.9999% | ||
| Ne, 99.9999% | ||
| HCl, Electronic | ||
| Kr, 99.999% | ||
| Xe, 99.999% | ||
| O2, 99.999% | ||
| H2, 99.999% | ||
| Gas operating temperature | - 40 0C ~ + 74 0C | |
| Gas pressure | 520 psig ~ 2400 psig / 35 Bar ~ 167 Bar | |
| Cylinder specification | 10L、16L、20L、50L | |
| Valve interface | CGA 679、CGA 330、CGA 580、DIN 6、DIN 8、DIN 14 | |
Online message
If you have any questions, please leave us a message and we will reply as soon as possible.